☰ Menu
ASMPT ALSI
|
English
☰ Menu
ASMPT ALSI
Home
Company
Applications
Process
Products
Technology
Support
Jobs
Contact
Back
Company
Core Strength
History
Center of Competence
About ASMPT
Back
Applications
Application Examples
IC – Micro – Logic
IC - Memory
IC – Analog
Opto
Sensors
Power Discrete
Back
Process
VI-Process
V-Process
Scribing
USP Matrix
UV Matrix
V-DOE
Multi-Beam
Back
Products
Grooving UV USP
Grooving UV
Dicing UVP
Dicing IR
Back
Technology
Kerf Check “On-The-Fly”
Inline Vision
Wavelength
Pulse Duration
Diffractive Optical Element (DOE)
Active Mounts
Back
Support
Support Activities
Application Support
Global Service Support Centres
Training
Back
Jobs
Internships
Back
Center of Competence
Mechatronics Team
Ai & Vision Team
MPU-CPU: Silicon (Si >200µm)
Diameter: 300 mm
Wafer material: Si
Thickness: 10 µm Al/Ti/SiO2/SiN – 290 µm Si – 20 µm DAF
Die pitch: 2780 µm x 3196 µm
Street width: 80 µm
Results
Process : Dicing-UV-ns # VI-Process
Modification width: 64 – 67 µm
Outer width: 54 – 57 µm
Inner width: 51 – 53 µm
Groove depth: > 15 µm
Burr height: 2 µm (non-metal area), 6 µm (metal area)
UPH : 1.5
In order to be able to use all functions of this website,
either a login or a registration is necessary.
Login
Register